Characterization: X-raydiffraction, electron microscopy, scanning probe microscopy, transportmeasurements, magnetic properties, optical properties,
Conventional lithographic fabrication: Thin film deposition, optical lithography, wet and dry etching techniques, electron beam lithography, focused ion beam lithography, X-ray lithography
Unconventional lithographic fabrication: Scanning probe lithography, interference or holographic lithography, step growth methods, nanoimprint lithography
soft lithography, near-field opticallithography, shadow masks, nanotemplates, nanosphere lithography, selfassembly, molecular lithography, chemical nanofabrication technique
Lectures T Th 9:25 - 10:40 AM
Term papers (25% for each of the two)
Text: Course notes
All information is representative only, and is likely to change from year to year.