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Physics 539: Characterization And Fabrication At The Nanoscale

 

 

 

Course Outline

 


Characterization: X-raydiffraction, electron microscopy, scanning probe microscopy, transportmeasurements, magnetic properties, optical properties,

 

Conventional lithographic fabrication: Thin film deposition, optical lithography, wet and dry etching techniques, electron beam lithography, focused ion beam lithography, X-ray lithography

 

Unconventional lithographic fabrication: Scanning probe lithography, interference or holographic lithography, step growth methods, nanoimprint lithography

 

soft lithography, near-field opticallithography, shadow masks, nanotemplates, nanosphere lithography, selfassembly, molecular lithography, chemical nanofabrication technique

 

 

 

Organization

 

Lectures T Th 9:25 - 10:40 AM

 

Homework (50%)

 

Term papers (25% for each of the two)

 

Text: Course notes

 

 

All information is representative only, and is likely to change from year to year.